Measuring the pitches
Silicon Almanac All explainers
Node names · Explainer 07

What “2 nm” means

A node’s name stopped measuring the chip long ago: Intel said in 2021 that node names stopped matching the gate length in 1997. The patch drawn here is the industry roadmap’s own “2 nm”: its gates stand 48 nm apart, 24 times the name.

1997node names stopped matching the gate length, Intel said in 2021
48 nmthe gate pitch IRDS gives its “2 nm” node
0.543 nmthe spacing of silicon’s crystal, NIST
Scene: a patch of transistors at the IEEE IRDS roadmap’s “2 nm” ground rules (2024 edition): gate pitch 48 nm, metal pitch 22 nm, gate length 14 nm, 3 sheets 6 nm thick, the corner nearest you cut away. The red bar is 2 nm at the same scale. Generic, no company’s design. 24 times: our arithmetic, 48 ÷ 2. 1997: Intel (July 2021). Lattice: NIST CODATA 2022. Sources are listed at the end.
Scroll to begin
01 · Down to the atoms

How long is 2 nm?

Slide from a virus down to silicon’s crystal, every object at its true size. The 2 nm bar spans 3.7 of silicon’s unit cells. Some layers are thinner than the name: Intel’s 65 nm transistors had a gate oxide 1.2 nm thick, which Intel put at 5 atomic layers.

Paolo Gargini, then chairman of IRDS, told IEEE Spectrum in 2020 that the node number had “nothing to do with any dimension that you can find on the die”.

SARS-CoV-2, 89.8 nm across on average. To its right, a gate pitch and a metal pitch at the same scale.

Two gates 48 nm apart, centre to centre: the gate pitch IRDS gives its “2 nm” node.

The finest metal lines, 22 nm apart: IRDS’s tightest metal pitch for “2 nm”.

One gate 12 nm long: IBM’s 2 nm test chip of 2021, “just two dozen atoms long” in IBM’s words.

A strand of DNA is 2.5 nm wide, a little wider than the name.

The red bar is 2 nm, laid on silicon’s crystal: each tick marks one unit cell, 0.543 nm.

In focus
A virus
2 nm is
3.7 unit cells
Virus: Klein and others, Heidelberg University, Nature Communications (2020). Pitches: IEEE IRDS 2024, More Moore. Gate: IBM (May 2021). DNA: US National Nanotechnology Coordination Office. Silicon: NIST CODATA 2022; atoms drawn on bonds 0.235 nm long (Princeton). Oxide: Intel (January 2007). Gargini: IEEE Spectrum (July 2020). Our arithmetic: 2 ÷ 0.5431. Drawn: the DNA’s length, the sheet under IBM’s gate.
02 · Gate pitch and metal pitch

Two pitches.

Intel’s Mark Bohr wrote in 2017 that one simple metric is gate pitch times minimum metal pitch, each a width plus the space beside it. Pick a node: the patch is redrawn at both, its name beside them.

Gate pitch
48 nm
Metal pitch
22 nm
Name says
2 nm
Source
IRDS roadmap (2024)

Not drawn: TSMC N2, its IEDM 2024 paper has “no pitches” (SemiWiki); TSMC N3, its 2022 papers gave N3’s gate pitch (45 nm) and N3E’s metal pitch (23 nm); Samsung, area ratios only.

Intel 22 and 14 nm: Intel (2014). TSMC N7, N5: Angstronomics (2022); N5’s gate and fin pitches measured on a shipping chip, its 28 nm metal pitch the M0 pitch they line up with. Intel 7, 4: Intel (2023). Intel 18A: Tom’s Hardware (2025), on Intel’s VLSI 2025 paper; its name as 18 Å, 1.8 nm, is our reading of Intel’s “angstrom era”. IRDS (2024). Bohr: Intel (2017). TSMC N3: SemiWiki (2023). Samsung (2022). Drawn: gate lengths, fins and sheets unless Intel, IEEE Spectrum or IRDS give them.
03 · July 2021

A node renamed.

In July 2021 Intel renamed its nodes: “10nm Enhanced SuperFin” became Intel 7, and “Intel 7nm” became Intel 4. Intel’s sentence on naming: “the various naming and numbering schemes used across the industry no longer refer to any specific measurement”. Its next names end in A, and Intel said 20A “ushers in the angstrom era”.

Intel’s slide of 2023 gives Intel 7 a gate pitch of 54 or 60 nm and a metal pitch of 40 nm. Angstronomics gives TSMC’s N7 57 and 40 nm.

Name
Intel 7
Gate pitch
54 or 60 nm
Metal pitch
40 nm
Intel: fact sheet and press release (26 July 2021); Intel 4 slide (2023), from its VLSI 2022 paper. TSMC N7: Angstronomics (2022). The patch is Intel 7 at a 54 nm gate pitch, fins 34 nm apart (Intel); the fins’ size is drawn.
04 · Transistor density

Count the transistors.

Bohr also proposed that chipmakers state logic transistor density in millions per square millimetre, by a formula that weights a small cell 0.6 and a large one 0.4. A million per mm² is one per µm²: the square, a micrometre a side, holds that many, rounded. Behind it, an E. coli bacterium, about 1 by 2 µm.

Million per mm²
90.6
In the square
91
Source
Angstronomics, calculated

TSMC states ratios: N3 “up to 1.6X logic density gain” over N5, N2 “>1.15x chip density increase” over its 3 nm. Philip Wong and others proposed in 2020 to count logic, memory and packaging/integration together.

Intel: Bohr (March 2017), 10 nm an estimate then. TSMC N7: Angstronomics (2022), by Bohr’s formula; N5: measured on Apple’s A15 (Angstronomics). TSMC (December 2022; IEDM 2024). Wong and others: Proceedings of the IEEE (2020). E. coli: Milo and Phillips. The count is our arithmetic; each transistor is a generic block.
05 · The roadmap

The roadmap stacks up.

IRDS, the IEEE’s roadmap, labels a node by lengths: “G48M22” is a 48 nm gate pitch and a 22 nm tightest metal pitch, “/T2” two tiers. Its 2024 edition takes the gate pitch from 48 nm (2024) to 42 nm (2039), with a CFET, n-type over p-type, from 2031 and tiers from 2035.

IRDS label
G48M22
Device
LGAA
Name IRDS prints
“2nm”
Gate length (HP)
14 nm
Tiers
1
A roadmap, dated 2024: IEEE IRDS, More Moore, table MM-7, read off its image, each year drawn to its pitches, spacer, contact, high-performance (HP) gate length and sheet width. LGAA: lateral gate-all-around. “A10 eq”: 10 Å, 1.0 nm, “eq” for equivalent, our reading (the 2022 edition printed “1.0nm eq”). Tiers’ bond drawn.
06 · Where to go next

Two pitches, from above.

From above, the gate lines run one way and the metal lines the other: the roadmap’s “2 nm” at 48 and 22 nm, the name a red sliver among them.

Chipmakers on this record: Intel, Rapidus, Samsung Foundry and TSMC; research: imec. Which fabs run which named node, in SEMI’s bands, is on the nodes page; SEMI’s capacity at 2 nm and below is on its figure page.

The patch from the start, seen from above.